516-0079/01 – Advanced Technologies of Nanostructures Preparation - Principles and Applications (PTN)
| Gurantor department | Institute of Physics | Credits | 4 |
| Subject guarantor | Mgr. Jaroslav Hamrle, Ph.D. | Subject version guarantor | Mgr. Jaroslav Hamrle, Ph.D. |
| Study level | undergraduate or graduate | Requirement | Compulsory |
| Year | 2 | Semester | winter |
| | Study language | Czech |
| Year of introduction | 2007/2008 | Year of cancellation | 2015/2016 |
| Intended for the faculties | USP | Intended for study types | Follow-up Master |
Subject aims expressed by acquired skills and competences
Classify and identify the progressive technologies in nanostructures.
Formulate the fundamentals of preparation and diagnostics of nanostructures.
Evaluate the advantages and disadvantages of discussed approaches.
Predict the new trends in applications.
Teaching methods
Lectures
Seminars
Individual consultations
Summary
Předmět podává přehled pokročilých technologií zaměřených na depozici tenkých
vrstev a povlaků a přípravu nanostruktur, zejména v podmínkách vakua. Zaměřuje
se především na vysvětlení fyzikálních principů těchto procesů a
odpovídajících technologických a analytických zařízení a komponent (např.
zdrojů svazků elektronů, iontů a neutrálních částic).
Compulsory literature:
BRODIE, I., MURAY, J. J.: The Physics of Micro/Nano-Fabrication, Plenum
Press, New York, 1992;
VÁLYI, L.: Atom and Ion Sources, John Wiley and Sons Ltd (March 1, 1978);
ECKERTOVÁ, L.: Physics of Thin Films, Plenum Press, New York, 1986;
FELDMAN, L. C., MAYER, J. W.: Fundamentals of Surface and Thin Film Analysis,
Elsevier Science Publishing Co., Inc., 1986;
RIVIERE, J. C.: Surface Analytical Techniques, Clarendon Press, Oxford, 1990.
Recommended literature:
BRODIE, I., MURAY, J. J.: The Physics of Micro/Nano-Fabrication, Plenum
Press, New York, 1992;
VÁLYI, L.: Atom and Ion Sources, John Wiley and Sons Ltd (March 1, 1978);
ECKERTOVÁ, L.: Physics of Thin Films, Plenum Press, New York, 1986;
FELDMAN, L. C., MAYER, J. W.: Fundamentals of Surface and Thin Film Analysis,
Elsevier Science Publishing Co., Inc., 1986;
RIVIERE, J. C.: Surface Analytical Techniques, Clarendon Press, Oxford, 1990.
Additional study materials
Way of continuous check of knowledge in the course of semester
E-learning
Other requirements
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Prerequisities
Subject has no prerequisities.
Co-requisities
Subject has no co-requisities.
Subject syllabus:
Content focus:
- Introduction to physical technologies. Description and overview of selected
physical technologies. The use of physical technologies.
- Principles of physical technologies, technological and analytical equipment.
Principles of growth layers. Interaction of particles with matter (electrons, ions, neutral
particles photons). Electron beam sources, parameters and calculation of electron sources.
Ion sources, parameters and calculation of ion sources. Electron and
ion optical systems. Sources of atoms and molecules, parameters and calculation
ion sources. Plasma as a source of chemically active particles. Source photons
optical systems.
- Physical technologies. Deposition of thin films and coatings,
nanostructures (evaporation, MBE, CVD, PECVD, magnetron and ion sputtering,
direct ion deposition, laser ablation, etc.). Alloy (diffusion, ion
implantation). Lithography. Etching of surfaces, thin films and coatings
(chemical etching, plasma etching and ion).
- Analysis of surfaces, thin films and nanostructures - overview. use
individual methods (STM, AFM, TEM, SEM, AES, RBS, ISS, SIMS, XPS, LEED, RHEED,
etc.). New trends in advanced materials technologies.
Conditions for subject completion
Occurrence in study plans
Occurrence in special blocks
Assessment of instruction