516-0079/01 – Advanced Technologies of Nanostructures Preparation - Principles and Applications (PTN)

Gurantor departmentInstitute of PhysicsCredits4
Subject guarantorMgr. Jaroslav Hamrle, Ph.D.Subject version guarantorMgr. Jaroslav Hamrle, Ph.D.
Study levelundergraduate or graduateRequirementCompulsory
Year2Semesterwinter
Study languageCzech
Year of introduction2007/2008Year of cancellation2015/2016
Intended for the facultiesUSPIntended for study typesFollow-up Master
Instruction secured by
LoginNameTuitorTeacher giving lectures
HAM0016 Mgr. Jaroslav Hamrle, Ph.D.
JES0009 Ing. Radek Ješko
SYK0048 Mgr. Rudolf Sýkora, Ph.D.
Extent of instruction for forms of study
Form of studyWay of compl.Extent
Full-time Credit and Examination 2+1

Subject aims expressed by acquired skills and competences

Classify and identify the progressive technologies in nanostructures. Formulate the fundamentals of preparation and diagnostics of nanostructures. Evaluate the advantages and disadvantages of discussed approaches. Predict the new trends in applications.

Teaching methods

Lectures
Seminars
Individual consultations

Summary

Předmět podává přehled pokročilých technologií zaměřených na depozici tenkých vrstev a povlaků a přípravu nanostruktur, zejména v podmínkách vakua. Zaměřuje se především na vysvětlení fyzikálních principů těchto procesů a odpovídajících technologických a analytických zařízení a komponent (např. zdrojů svazků elektronů, iontů a neutrálních částic).

Compulsory literature:

BRODIE, I., MURAY, J. J.: The Physics of Micro/Nano-Fabrication, Plenum Press, New York, 1992; VÁLYI, L.: Atom and Ion Sources, John Wiley and Sons Ltd (March 1, 1978); ECKERTOVÁ, L.: Physics of Thin Films, Plenum Press, New York, 1986; FELDMAN, L. C., MAYER, J. W.: Fundamentals of Surface and Thin Film Analysis, Elsevier Science Publishing Co., Inc., 1986; RIVIERE, J. C.: Surface Analytical Techniques, Clarendon Press, Oxford, 1990.

Recommended literature:

BRODIE, I., MURAY, J. J.: The Physics of Micro/Nano-Fabrication, Plenum Press, New York, 1992; VÁLYI, L.: Atom and Ion Sources, John Wiley and Sons Ltd (March 1, 1978); ECKERTOVÁ, L.: Physics of Thin Films, Plenum Press, New York, 1986; FELDMAN, L. C., MAYER, J. W.: Fundamentals of Surface and Thin Film Analysis, Elsevier Science Publishing Co., Inc., 1986; RIVIERE, J. C.: Surface Analytical Techniques, Clarendon Press, Oxford, 1990.

Way of continuous check of knowledge in the course of semester

E-learning

Další požadavky na studenta

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Prerequisities

Subject has no prerequisities.

Co-requisities

Subject has no co-requisities.

Subject syllabus:

Content focus: - Introduction to physical technologies. Description and overview of selected physical technologies. The use of physical technologies. - Principles of physical technologies, technological and analytical equipment. Principles of growth layers. Interaction of particles with matter (electrons, ions, neutral particles photons). Electron beam sources, parameters and calculation of electron sources. Ion sources, parameters and calculation of ion sources. Electron and ion optical systems. Sources of atoms and molecules, parameters and calculation ion sources. Plasma as a source of chemically active particles. Source photons optical systems. - Physical technologies. Deposition of thin films and coatings, nanostructures (evaporation, MBE, CVD, PECVD, magnetron and ion sputtering, direct ion deposition, laser ablation, etc.). Alloy (diffusion, ion implantation). Lithography. Etching of surfaces, thin films and coatings (chemical etching, plasma etching and ion). - Analysis of surfaces, thin films and nanostructures - overview. use individual methods (STM, AFM, TEM, SEM, AES, RBS, ISS, SIMS, XPS, LEED, RHEED, etc.). New trends in advanced materials technologies.

Conditions for subject completion

Full-time form (validity from: 2015/2016 Winter semester, validity until: 2015/2016 Summer semester)
Task nameType of taskMax. number of points
(act. for subtasks)
Min. number of points
Credit and Examination Credit and Examination 100 (100) 51
        Credit Credit 40  20
        Examination Examination 60  11
Mandatory attendence parzicipation:

Show history

Occurrence in study plans

Academic yearProgrammeField of studySpec.FormStudy language Tut. centreYearWSType of duty
2015/2016 (N3942) Nanotechnology (3942T001) Nanotechnology P Czech Ostrava 2 Compulsory study plan
2014/2015 (N3942) Nanotechnology (3942T001) Nanotechnology P Czech Ostrava 2 Compulsory study plan
2014/2015 (N3942) Nanotechnology P Czech Ostrava 2 Compulsory study plan
2013/2014 (N3942) Nanotechnology (3942T001) Nanotechnology P Czech Ostrava 2 Compulsory study plan
2012/2013 (N3942) Nanotechnology (3942T001) Nanotechnology P Czech Ostrava 2 Compulsory study plan
2011/2012 (N3942) Nanotechnology (3942T001) Nanotechnology P Czech Ostrava 2 Compulsory study plan
2010/2011 (N3942) Nanotechnology (3942T001) Nanotechnology P Czech Ostrava 2 Compulsory study plan
2009/2010 (N3942) Nanotechnology (3942T001) Nanotechnology P Czech Ostrava 2 Compulsory study plan
2008/2009 (N3942) Nanotechnology (3942T001) Nanotechnology P Czech Ostrava 2 Compulsory study plan

Occurrence in special blocks

Block nameAcademic yearForm of studyStudy language YearWSType of blockBlock owner