637-0825/01 – Matrerals for microelectronics (MME)

Gurantor departmentDepartment of Non-ferrous Metals, Refining and RecyclingCredits3
Subject guarantorprof. Ing. Jaromír Drápala, CSc.Subject version guarantorprof. Ing. Jaromír Drápala, CSc.
Study levelundergraduate or graduateRequirementChoice-compulsory
Year2Semestersummer
Study languageCzech
Year of introduction2007/2008Year of cancellation
Intended for the facultiesFMT, USPIntended for study typesFollow-up Master
Instruction secured by
LoginNameTuitorTeacher giving lectures
DRA30 prof. Ing. Jaromír Drápala, CSc.
Extent of instruction for forms of study
Form of studyWay of compl.Extent
Full-time Credit and Examination 2+2

Subject aims expressed by acquired skills and competences

Student after passing the exam from this subject will be able to: - acquire an overview of prospective materials for microelectronics - write up possibilities of individual technologies for production of materials for microelectronics

Teaching methods

Lectures
Seminars
Individual consultations
Tutorials
Project work

Summary

The subject is oriented on characteristic of processes for preparation of individual types of micro- and nano-structural materials and materials that are used by the existing technologies in relation to micro-technologies, used materials and directions of development for the needs of qualified solution of problems connected with continuing miniaturisation of electronic systems and elements. It deals also with technologies for preparation of physically and chemical highly pure materials, basic processes and materials of contemporary micro-technology of semi-conducting materials and integrated circuits with very high integration, impact of geometric dimensions on properties of solid materials, mechanisms of non-equilibrium processes of formation of micro- and nano-structure, principles of selectivity and procedures of technological operations, synthesis, forming of micro- and nano-layers, processing of bulk materials, their characterisation, properties and applications in electronics. Lectures on theory of synthesis of micro- and nano-materials, molecular engineering, micro-technologies give an idea about technologies of next decades.

Compulsory literature:

WHITAKER, J.C.: Microelectronics. Second Edition. CRC Press, 2006. BOUDA, V., HAMPL, J., LIPTÁK, J.: Materials for Electronics. University mimeographed, ČVUT Prague, 2000. HARPER, Ch.A.: Electronic Materials and Processes Handbook. McGraw-Hill, 2004. DORF, R.C.: The Electrical Engineering Handbook Series. Second Edition. CRC Press, 2005.

Recommended literature:

KLAUK HAGEN: Organic Electronics: Materials, Munufacturing and Applications. Willey-VCH, 2006.

Way of continuous check of knowledge in the course of semester

2 tests of knowledge

E-learning

http://www.person.vsb.cz/archivcd/FMMI/ETMAT/

Other requirements

3 computer programs 2 projects - seminar exercise

Prerequisities

Subject has no prerequisities.

Co-requisities

Subject has no co-requisities.

Subject syllabus:

1. Basic characteristics and demands on micro - and nanoelectronics materials. Technology and preparation of physical and highly chemically pure materials. Physical, chemical and physico - chemical methods of the purification of metallic and non-metallic materials and their characterization. 2. Methods of the preparation of highly pure and structural defined materials with monocrystalline structure for new type of electronic, optoelectronic and magnetic components. Influence of electrically active elements on characteristics of the electronic parts. 3. Basic processes and materials. Contemporary semiconductor and integrated circuits technologies, general structure of technologies applied in microelectronics, evolution and kinds of technologies, preparation of substrates, photolithography, basic materials used at creation of textures in semiconductor elements. 4. Basic semiconductors and semiconductor compounds, dielectric nanolayers and methods their formation, metallic contacts and internal wiring, micro - doping, technological defects in semiconductor elements, principles check - up and automatization of technological processes. 5. Influence of geometric proportions on properties of solid materials. Properties of microcrystals and crystallization seeds, basic period of the formation of nanolayers and areas their using, dimensioned effects in structure of electronic elements 6. Miniaturization and topology of electronic elements, nanotechnology operation and functional characteristics of parts, mechanism of the degradation of electronic elements. 7. Mechanism of non-equilibrium processes of the formation of nanostructure. Classification of theoretic models of the crystallization, quasi - equilibrium and kinetic models, kinetic- statistic models of the creation of layers from molecular beam epitaxy, mechanism of the growth of nanolayers using chemical reaction (CVD, MO CVD, ). 8. Mechanism of basic processes of the growth of nanolayers, epitaxy, evaporation, sputtering and ionic implantation, diffusion in semiconductors. 9. Microelectronics. Principle of selectivity and procedure of microtechnology operations. Fundamental criteria of the classification of local operations, methods of formation of the starting topology figure on bed, masking, locally activated operation, topology conversion and generation of additional structure elements by the help of selective operations. 10. Generation horizontal classification structures. Lithographic methods. EUV lithography, electron and ionic configuring lithography. Reactive ionic etching. Formation of vertical microstructures. Epitaxial methods. Molecular beam epitaxy, epitaxy from metall-organic substances. Technology of the preparation of quantum points on the base of semiconductors. 11. Final operation, physical methods of check - up of defects, composition and circuits of local operations, fundamental conditions of the total removing of mechanical connections. LP CVD, LE CVD, PETEOS methods. Proposal of the micro-transistor, physical simulation. 12. Micro-optoelectronics, AIIIBV, AIIBVI …compounds. Materials for laser technique, radiation detectors, solar technique. 13. Magnetic and dielectric materials. Oxide materials for memory elements (ferrites, ferroelectrics), materials for bubble memories (garnets). 14. Liquid crystals. Nematic, lamellar and columnar systems - structure and its transformation, materials for special purposes, whiskers.

Conditions for subject completion

Full-time form (validity from: 2012/2013 Summer semester)
Task nameType of taskMax. number of points
(act. for subtasks)
Min. number of pointsMax. počet pokusů
Exercises evaluation and Examination Credit and Examination 100 (100) 51
        Exercises evaluation Credit 40  25 2
        Examination Examination 60  16 3
Mandatory attendence participation:

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Conditions for subject completion and attendance at the exercises within ISP:

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Occurrence in study plans

Academic yearProgrammeBranch/spec.Spec.ZaměřeníFormStudy language Tut. centreYearWSType of duty
2021/2022 (N0719A270002) Nanotechnology P Czech Ostrava 2 Choice-compulsory type B study plan
2020/2021 (N0719A270002) Nanotechnology P Czech Ostrava 2 Choice-compulsory type B study plan
2019/2020 (N3942) Nanotechnology (3942T001) Nanotechnology P Czech Ostrava 2 Choice-compulsory study plan
2019/2020 (N0719A270002) Nanotechnology P Czech Ostrava 2 Choice-compulsory type B study plan
2018/2019 (N3942) Nanotechnology (3942T001) Nanotechnology P Czech Ostrava 2 Choice-compulsory study plan
2017/2018 (N3942) Nanotechnology (3942T001) Nanotechnology P Czech Ostrava 2 Choice-compulsory study plan
2016/2017 (N3942) Nanotechnology (3942T001) Nanotechnology P Czech Ostrava 2 Choice-compulsory study plan
2015/2016 (N3942) Nanotechnology (3942T001) Nanotechnology P Czech Ostrava 2 Choice-compulsory study plan
2014/2015 (N3942) Nanotechnology (3942T001) Nanotechnology P Czech Ostrava 2 Choice-compulsory study plan
2014/2015 (N3942) Nanotechnology P Czech Ostrava 2 Choice-compulsory study plan
2013/2014 (N3942) Nanotechnology (3942T001) Nanotechnology P Czech Ostrava 2 Choice-compulsory study plan
2012/2013 (N3942) Nanotechnology (3942T001) Nanotechnology P Czech Ostrava 2 Choice-compulsory study plan
2011/2012 (N3942) Nanotechnology (3942T001) Nanotechnology P Czech Ostrava 2 Choice-compulsory study plan
2010/2011 (N3942) Nanotechnology (3942T001) Nanotechnology P Czech Ostrava 1 Choice-compulsory study plan
2010/2011 (N3942) Nanotechnology (3942T001) Nanotechnology P Czech Ostrava 2 Choice-compulsory study plan
2009/2010 (N3942) Nanotechnology (3942T001) Nanotechnology P Czech Ostrava 1 Choice-compulsory study plan
2009/2010 (N3942) Nanotechnology (3942T001) Nanotechnology P Czech Ostrava 2 Choice-compulsory study plan
2008/2009 (N3942) Nanotechnology (3942T001) Nanotechnology P Czech Ostrava 1 Choice-compulsory study plan
2008/2009 (N3942) Nanotechnology (3942T001) Nanotechnology P Czech Ostrava 2 Choice-compulsory study plan

Occurrence in special blocks

Block nameAcademic yearForm of studyStudy language YearWSType of blockBlock owner

Assessment of instruction

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