9360-0157/01 – Advanced Technologies of Nanostructures Preparation - Principles and Applications (PTN)

Gurantor departmentCNT - Nanotechnology CentreCredits4
Subject guarantordoc. Dr. Mgr. Kamil PostavaSubject version guarantordoc. Dr. Mgr. Kamil Postava
Study levelundergraduate or graduateRequirementCompulsory
Year2Semesterwinter
Study languageCzech
Year of introduction2018/2019Year of cancellation
Intended for the facultiesUSPIntended for study typesFollow-up Master
Instruction secured by
LoginNameTuitorTeacher giving lectures
JES0009 Ing. Radek Ješko
POS40 doc. Dr. Mgr. Kamil Postava
SYK0048 Mgr. Rudolf Sýkora, Ph.D.
Extent of instruction for forms of study
Form of studyWay of compl.Extent
Full-time Credit and Examination 2+1

Subject aims expressed by acquired skills and competences

Classify and identify the progressive technologies in nanostructures. Formulate the fundamentals of preparation and diagnostics of nanostructures. Evaluate the advantages and disadvantages of discussed approaches. Predict the new trends in applications.

Teaching methods

Lectures
Seminars
Individual consultations

Summary

Předmět podává přehled pokročilých technologií zaměřených na depozici tenkých vrstev a povlaků a přípravu nanostruktur, zejména v podmínkách vakua. Zaměřuje se především na vysvětlení fyzikálních principů těchto procesů a odpovídajících technologických a analytických zařízení a komponent (např. zdrojů svazků elektronů, iontů a neutrálních částic).

Compulsory literature:

BRODIE, I., MURAY, J. J.: The Physics of Micro/Nano-Fabrication, Plenum Press, New York, 1992; VÁLYI, L.: Atom and Ion Sources, John Wiley and Sons Ltd (March 1, 1978); ECKERTOVÁ, L.: Physics of Thin Films, Plenum Press, New York, 1986; FELDMAN, L. C., MAYER, J. W.: Fundamentals of Surface and Thin Film Analysis, Elsevier Science Publishing Co., Inc., 1986; RIVIERE, J. C.: Surface Analytical Techniques, Clarendon Press, Oxford, 1990.

Recommended literature:

BRODIE, I., MURAY, J. J.: The Physics of Micro/Nano-Fabrication, Plenum Press, New York, 1992; VÁLYI, L.: Atom and Ion Sources, John Wiley and Sons Ltd (March 1, 1978); ECKERTOVÁ, L.: Physics of Thin Films, Plenum Press, New York, 1986; FELDMAN, L. C., MAYER, J. W.: Fundamentals of Surface and Thin Film Analysis, Elsevier Science Publishing Co., Inc., 1986; RIVIERE, J. C.: Surface Analytical Techniques, Clarendon Press, Oxford, 1990.

Way of continuous check of knowledge in the course of semester

E-learning

Other requirements

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Prerequisities

Subject has no prerequisities.

Co-requisities

Subject has no co-requisities.

Subject syllabus:

Content focus: - Introduction to physical technologies. Description and overview of selected physical technologies. The use of physical technologies. - Principles of physical technologies, technological and analytical equipment. Principles of growth layers. Interaction of particles with matter (electrons, ions, neutral particles photons). Electron beam sources, parameters and calculation of electron sources. Ion sources, parameters and calculation of ion sources. Electron and ion optical systems. Sources of atoms and molecules, parameters and calculation ion sources. Plasma as a source of chemically active particles. Source photons optical systems. - Physical technologies. Deposition of thin films and coatings, nanostructures (evaporation, MBE, CVD, PECVD, magnetron and ion sputtering, direct ion deposition, laser ablation, etc.). Alloy (diffusion, ion implantation). Lithography. Etching of surfaces, thin films and coatings (chemical etching, plasma etching and ion). - Analysis of surfaces, thin films and nanostructures - overview. use individual methods (STM, AFM, TEM, SEM, AES, RBS, ISS, SIMS, XPS, LEED, RHEED, etc.). New trends in advanced materials technologies.

Conditions for subject completion

Full-time form (validity from: 2018/2019 Winter semester)
Task nameType of taskMax. number of points
(act. for subtasks)
Min. number of points
Credit and Examination Credit and Examination 100  51
        Credit Credit  
        Examination Examination  
Mandatory attendence parzicipation:

Show history

Occurrence in study plans

Academic yearProgrammeField of studySpec.ZaměřeníFormStudy language Tut. centreYearWSType of duty
2020/2021 (N3942) Nanotechnology (3942T001) Nanotechnology P Czech Ostrava 2 Compulsory study plan
2019/2020 (N3942) Nanotechnology (3942T001) Nanotechnology P Czech Ostrava 2 Compulsory study plan
2018/2019 (N3942) Nanotechnology (3942T001) Nanotechnology P Czech Ostrava 2 Compulsory study plan

Occurrence in special blocks

Block nameAcademic yearForm of studyStudy language YearWSType of blockBlock owner