9360-0158/02 – Pokročilé technologie přípravy nanostruktur I (PTPI)
| Gurantor department | CNT - Nanotechnology Centre | Credits | 4 |
| Subject guarantor | doc. Dr. Mgr. Kamil Postava | Subject version guarantor | doc. Dr. Mgr. Kamil Postava |
| Study level | undergraduate or graduate | Requirement | Compulsory |
| Year | 2 | Semester | winter |
| | Study language | English |
| Year of introduction | 2019/2020 | Year of cancellation | |
| Intended for the faculties | FMT | Intended for study types | Follow-up Master |
Subject aims expressed by acquired skills and competences
Classify and identify the progressive technologies in nanostructures.
Formulate the fundamentals of preparation and diagnostics of nanostructures.
Evaluate the advantages and disadvantages of discussed approaches.
Predict the new trends in applications.
Teaching methods
Lectures
Summary
The course explains the principles of advanced technologies for the preparation of thin films, coatings, nanostructures, integrated circuits and optoelectronics. It includes methods for gas, liquid and solid phase deposition, both at atmospheric pressure and in vacuum, with or without the use of plasma, laser radiation, ion etching, electron gun, resistive evaporation sources, sputtering, or etching. It focuses primarily on explaining the physical principles of these processes and the corresponding technological and analytical devices and components (eg. electron, ion and neutral beam sources). At the same time it explains the most used methods for characterization of prepared materials with main emphasis on in-situ methods.
Compulsory literature:
Recommended literature:
BRODIE, I., MURAY, J. J.: The Physics of Micro/Nano-Fabrication. Plenum Press, New York, 1992.
VÁLYI, L.: Atom and Ion Sources. John Wiley and Sons Ltd (March 1, 1978).
ECKERTOVÁ, L.: Physics of Thin Films. Plenum Press, New York, 1986.
FELDMAN, L. C., MAYER, J. W.: Fundamentals of Surface and Thin Film Analysis. Elsevier Science Publishing Co., Inc., 1986.
RIVIERE, J. C.: Surface Analytical Techniques. Clarendon Press, Oxford, 1990.
Way of continuous check of knowledge in the course of semester
Forma způsobu ověření studijních výsledků a další požadavky na studenta EN:
Credit test (30b)
Class oral examination (70b)
E-learning
Other requirements
Overview and understanding of principles of preparation methods and in-situ characterization techniques.
Prerequisities
Subject has no prerequisities.
Co-requisities
Subject has no co-requisities.
Subject syllabus:
1. Introduction to preparation technologies, their scope and use in research and industry.
2. The principles of layer growth. Interaction of particles with solid materials (electrons, ions, neutral particles).
3. Used sources of electrons, ions, atoms, molecules, plasma, photons and their parameters. Elements for their manipulation and measurement.
4. Physical methods for the preparation of nanostructures (evaporation, DC, RF, reactive, magnetron and ion sputtering, pulsed laser deposition, evaporation with additional ion beam).
5. Chemical and combined methods of preparation (types of reactions used, thermal and organometal CVD processes, plasma and laser enhanced CVD, processes thermodynamics, gas transfer in deposition chambers, layer growth kinetics).
6. Lithographic processes, two-photon polymerization, alloying (ion implantation) and plasma etching.
7. Nucleation on substrate (capillary theory and atomic models). Layer growth modes. Reconstruction, material and electron structure of surfaces. Defects in monocrystalline growth. Methods for epitaxy (MBE, LPE, LEGO, MOVPE, ALE).
8. Analysis of surfaces, thin layers and nanostructures - Overview of in-situ and ex-situ methods. Usecases of individual methods (STM, AFM, TEM, SEM AES, RBS, ISS, SIMS, XPS, LEED, RHEED, etc.).
9. New trends in advanced methods for material preparations.
Conditions for subject completion
Occurrence in study plans
Occurrence in special blocks
Assessment of instruction
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