9360-0158/02 – Pokročilé technologie přípravy nanostruktur I (PTPI)

Gurantor departmentCNT - Nanotechnology CentreCredits4
Subject guarantordoc. Dr. Mgr. Kamil PostavaSubject version guarantordoc. Dr. Mgr. Kamil Postava
Study levelundergraduate or graduateRequirementCompulsory
Study languageEnglish
Year of introduction2019/2020Year of cancellation
Intended for the facultiesFMTIntended for study typesFollow-up Master
Instruction secured by
LoginNameTuitorTeacher giving lectures
HAL29 Ing. Lukáš Halagačka, Ph.D.
POS40 doc. Dr. Mgr. Kamil Postava
Extent of instruction for forms of study
Form of studyWay of compl.Extent
Full-time Credit 3+0

Subject aims expressed by acquired skills and competences

Classify and identify the progressive technologies in nanostructures. Formulate the fundamentals of preparation and diagnostics of nanostructures. Evaluate the advantages and disadvantages of discussed approaches. Predict the new trends in applications.

Teaching methods



The course explains the principles of advanced technologies for the preparation of thin films, coatings, nanostructures, integrated circuits and optoelectronics. It includes methods for gas, liquid and solid phase deposition, both at atmospheric pressure and in vacuum, with or without the use of plasma, laser radiation, ion etching, electron gun, resistive evaporation sources, sputtering, or etching. It focuses primarily on explaining the physical principles of these processes and the corresponding technological and analytical devices and components (eg. electron, ion and neutral beam sources). At the same time it explains the most used methods for characterization of prepared materials with main emphasis on in-situ methods.

Compulsory literature:

OHRING, M.: Materials Science of Thin Films. 2nd ed. San Diego: Academic Press, 2002, 794 s. ISBN 0125249756. OURA, K., LIFSHITS, V.G., SARANIN, A., ZOTOV, A.V., KATAYAMA, M.: Surface Science: An Introduction. New York: Springer, 2003, 440 s. ISBN 3540005455. KITTEL, C.: Introduction to Solid State Physics. 8th ed. Hoboken, NJ: Wiley, c2005. ISBN 047141526x.

Recommended literature:

BRODIE, I., MURAY, J. J.: The Physics of Micro/Nano-Fabrication. Plenum Press, New York, 1992. VÁLYI, L.: Atom and Ion Sources. John Wiley and Sons Ltd (March 1, 1978). ECKERTOVÁ, L.: Physics of Thin Films. Plenum Press, New York, 1986. FELDMAN, L. C., MAYER, J. W.: Fundamentals of Surface and Thin Film Analysis. Elsevier Science Publishing Co., Inc., 1986. RIVIERE, J. C.: Surface Analytical Techniques. Clarendon Press, Oxford, 1990.

Way of continuous check of knowledge in the course of semester

Forma způsobu ověření studijních výsledků a další požadavky na studenta EN: Credit test (30b) Class oral examination (70b)


Other requirements

Overview and understanding of principles of preparation methods and in-situ characterization techniques.


Subject has no prerequisities.


Subject has no co-requisities.

Subject syllabus:

1. Introduction to preparation technologies, their scope and use in research and industry. 2. The principles of layer growth. Interaction of particles with solid materials (electrons, ions, neutral particles). 3. Used sources of electrons, ions, atoms, molecules, plasma, photons and their parameters. Elements for their manipulation and measurement. 4. Physical methods for the preparation of nanostructures (evaporation, DC, RF, reactive, magnetron and ion sputtering, pulsed laser deposition, evaporation with additional ion beam). 5. Chemical and combined methods of preparation (types of reactions used, thermal and organometal CVD processes, plasma and laser enhanced CVD, processes thermodynamics, gas transfer in deposition chambers, layer growth kinetics). 6. Lithographic processes, two-photon polymerization, alloying (ion implantation) and plasma etching. 7. Nucleation on substrate (capillary theory and atomic models). Layer growth modes. Reconstruction, material and electron structure of surfaces. Defects in monocrystalline growth. Methods for epitaxy (MBE, LPE, LEGO, MOVPE, ALE). 8. Analysis of surfaces, thin layers and nanostructures - Overview of in-situ and ex-situ methods. Usecases of individual methods (STM, AFM, TEM, SEM AES, RBS, ISS, SIMS, XPS, LEED, RHEED, etc.). 9. New trends in advanced methods for material preparations.

Conditions for subject completion

Full-time form (validity from: 2019/2020 Winter semester)
Task nameType of taskMax. number of points
(act. for subtasks)
Min. number of pointsMax. počet pokusů
Credit Credit 100  51 3
Mandatory attendence participation: Completion of all course exercises for the given semester.

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Conditions for subject completion and attendance at the exercises within ISP:

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Occurrence in study plans

Academic yearProgrammeBranch/spec.Spec.ZaměřeníFormStudy language Tut. centreYearWSType of duty
2024/2025 (N0719A270003) Nanotechnology PMP P English Ostrava 2 Compulsory study plan
2023/2024 (N0719A270003) Nanotechnology PMP P English Ostrava 2 Compulsory study plan
2022/2023 (N0719A270003) Nanotechnology PMP P English Ostrava 2 Compulsory study plan
2021/2022 (N0719A270003) Nanotechnology PMP P English Ostrava 2 Compulsory study plan
2020/2021 (N0719A270003) Nanotechnology PMP P English Ostrava 2 Compulsory study plan
2019/2020 (N0719A270003) Nanotechnology PMP P English Ostrava 2 Compulsory study plan

Occurrence in special blocks

Block nameAcademic yearForm of studyStudy language YearWSType of blockBlock owner

Assessment of instruction

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