9360-0159/01 – Practice of Advanced Nanostructure Preparation Technologies I (PPTPI)

Gurantor departmentCNT - Nanotechnology CentreCredits3
Subject guarantordoc. Dr. Mgr. Kamil PostavaSubject version guarantordoc. Dr. Mgr. Kamil Postava
Study levelundergraduate or graduateRequirementCompulsory
Year2Semesterwinter
Study languageCzech
Year of introduction2019/2020Year of cancellation
Intended for the facultiesFMTIntended for study typesFollow-up Master
Instruction secured by
LoginNameTuitorTeacher giving lectures
POS40 doc. Dr. Mgr. Kamil Postava
Extent of instruction for forms of study
Form of studyWay of compl.Extent
Full-time Graded credit 0+3

Subject aims expressed by acquired skills and competences

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Teaching methods

Seminars
Tutorials

Summary

The main target of the advanced technology of nanostructure preparation is to obtain practical skills in the field thin film deposition using physical vapor deposition (PVD) and laser lithography. Students will use research laboratory equipment and setups.

Compulsory literature:

OHRING, M.: Materials Science of Thin Films. 2nd ed. San Diego: Academic Press, 2002. BRODIE, I., MURAY, J. J.: The Physics of Micro/Nano-Fabrication. Plenum Press, New York, 1992; VÁLYI, L.: Atom and Ion Sources. John Wiley and Sons Ltd (March 1, 1978); MACK, C. A.: Field guide to optical lithography, SPIE Press 2006.

Recommended literature:

LIN, B. J.: Optical Lithography, SPIE Press 2010. ECKERTOVÁ, L.: Physics of Thin Films. Plenum Press, New York, 1986 FELDMAN, L. C., MAYER, J. W.: Fundamentals of Surface and Thin Film Analysis. Elsevier Science Publishing Co., Inc., 1986

Way of continuous check of knowledge in the course of semester

Presentation of prepared structures. Evaluation of measurement report about preparation of samples.

E-learning

Other requirements

Preparation of thin films and microstructures, work in a clean room.

Prerequisities

Subject has no prerequisities.

Co-requisities

Subject has no co-requisities.

Subject syllabus:

Laboratory training include preparation of thin films of dielectrics, semiconductors, and metals and master of lithographic processes. It is based on the particular items: 1. Preparation of thin films by physical vapor deposition processes (PVD) – including processes of magnetron sputtering and evaporation, control of vacuum system, and computer control of the processes 2. Lithographic process including preparation of photoresist using spin coating, input and exposition of the structure using laser lithograph, development and finalization of the lithographic process 3. Characterization of the prepared samples using ex-situ methods – ellipsometry, spectroscopy, optical microscopy, atomic force microscopy (AFM), electron microscopy

Conditions for subject completion

Full-time form (validity from: 2019/2020 Winter semester)
Task nameType of taskMax. number of points
(act. for subtasks)
Min. number of points
Graded credit Graded credit 100  51
Mandatory attendence parzicipation: Submission of the protocol for individual exercises in specified terms.

Show history

Occurrence in study plans

Academic yearProgrammeField of studySpec.ZaměřeníFormStudy language Tut. centreYearWSType of duty
2021/2022 (N0719A270002) Nanotechnology P Czech Ostrava 2 Compulsory study plan
2020/2021 (N0719A270002) Nanotechnology P Czech Ostrava 2 Compulsory study plan
2019/2020 (N0719A270002) Nanotechnology P Czech Ostrava 2 Compulsory study plan

Occurrence in special blocks

Block nameAcademic yearForm of studyStudy language YearWSType of blockBlock owner