9360-0159/02 – Practice of Advanced Nanostructure Preparation Technologies I (PPTPI)
| Gurantor department | CNT - Nanotechnology Centre | Credits | 3 |
| Subject guarantor | doc. Dr. Mgr. Kamil Postava | Subject version guarantor | doc. Dr. Mgr. Kamil Postava |
| Study level | undergraduate or graduate | Requirement | Compulsory |
| Year | 2 | Semester | winter |
| | Study language | English |
| Year of introduction | 2019/2020 | Year of cancellation | 2024/2025 |
| Intended for the faculties | FMT | Intended for study types | Follow-up Master |
Subject aims expressed by acquired skills and competences
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Teaching methods
Seminars
Tutorials
Summary
The main target of the advanced technology of nanostructure preparation is to obtain practical skills in the field thin film deposition using physical vapor deposition (PVD) and laser lithography. Students will use research laboratory equipment and setups.
Compulsory literature:
OHRING, M.: Materials Science of Thin Films. 2nd ed. San Diego: Academic Press, 2002.
BRODIE, I., MURAY, J. J.: The Physics of Micro/Nano-Fabrication. Plenum Press, New York, 1992;
VÁLYI, L.: Atom and Ion Sources. John Wiley and Sons Ltd (March 1, 1978);
MACK, C. A.: Field guide to optical lithography, SPIE Press 2006.
Recommended literature:
LIN, B. J.: Optical Lithography, SPIE Press 2010.
ECKERTOVÁ, L.: Physics of Thin Films. Plenum Press, New York, 1986
FELDMAN, L. C., MAYER, J. W.: Fundamentals of Surface and Thin Film Analysis. Elsevier Science Publishing Co., Inc., 1986
Additional study materials
Way of continuous check of knowledge in the course of semester
Presentation of prepared structures. Evaluation of measurement report about preparation of samples.
E-learning
Other requirements
Preparation of thin films and microstructures, work in a clean room.
Prerequisities
Subject has no prerequisities.
Co-requisities
Subject has no co-requisities.
Subject syllabus:
Laboratory training include preparation of thin films of dielectrics, semiconductors, and metals and master of lithographic processes. It is based on the particular items:
1. Preparation of thin films by physical vapor deposition processes (PVD) – including processes of magnetron sputtering and evaporation, control of vacuum system, and computer control of the processes
2. Lithographic process including preparation of photoresist using spin coating, input and exposition of the structure using laser lithograph, development and finalization of the lithographic process
3. Characterization of the prepared samples using ex-situ methods – ellipsometry, spectroscopy, optical microscopy, atomic force microscopy (AFM), electron microscopy
Conditions for subject completion
Occurrence in study plans
Occurrence in special blocks
Assessment of instruction